Team Role
Managing IP Director of FAI
19 years of Patent experience
Areas of Practice
- US, European and International utility and design patent drafting, filing and prosecution
- Worldwide IP procurement strategy and portfolio management
- Patent Expert Witness Support
- Unified Patent Court (UPC) Representative
Technology Areas
- Electrical & Electronic Engineering
- Software & Computer Hardware Technologies
- Applied Physics including Optics, Semiconductors, Insulators
- Laser & Charged Particle Beams, Solid State Physics, Nuclear Physics
- Software & Computer Programs
- Artificial Intelligence
- Blockchain, Cryptocurrency
- Multimedia, Social Media, Social Networks
- Fintech
- Internet of Things
- Applied Optics including Augmented Reality and Virtual Reality Devices
- Plasma, Ion Beam and Laser Processing
- Semiconductors
- Sensors
- Telecommunications including IP Telephony and Wireless Technology
- Medical Devices
- Electrical Circuits
- Computer Hardware & Networks
- Financial Transactions
- Materials including Carbon Fiber Technology
- Mechanical Apparatus
- Nuclear Physics
- Nanotechnology
Representation
- USPTO – Unites States Patent and Trademark Office
- EP0 – European Patent Office
- UPC – The Unified Patent Court
- UKIP0 – United Kingdom Intellectual Property Office
Committees
- 2024 February – Present – Appointed to the Standing Advisory Committee before the European Patent Office (SACEPO)
- Member of SACEPO Working Party on Quality
Memberships
- FICPI – International Federation of Intellectual Property Attorneys
- EPI -European Patent Institute
- CIPA – UK Chartered Institute of Patent Attorneys
- INTA – International Trade Mark Association
- BABC – British American Business Council
Recent Presentations
- Robotics, Artificial Intelligence, and the Law, Silicon Valley, 2020
- Topic: Who will be the Inventor on AI Patents?
Background
FAI founder Dr. Matthew Franklin Lambrinos is an International Patent Prosecutor in High Technology with over 19 years experience in the successful preparation and prosecution of Patents. He has an extensive technical background including a Ph.D in Thin Film Technology for Optical & Electronic Devices. Dr. Lambrinos is a European Patent Attorney, Registered US Patent Agent, Certified Patent Valuation Analyst, UK Trade Mark Attorney and UK Design Attorney and former European Community Design Attorney. He has worked on hundreds of Patent Applications and represented a broad range of clients from US nanotechnology start ups to Japanese National Laboratories to in-house counsel of European multinational telecommunication companies. He also provides patent expert opinion support to patent litigation attorneys.
Dr. Lambrinos earned a Certificate in Intellectual Property Law from the University of London in the United Kingdom focusing on the many practical aspects of patents, trade marks, designs, copyright and EU competition law. In private practice, he qualified as a European Patent Attorney and then a Registered US Patent Agent. Dr. Lambrinos is admitted to the US Patent Bar, the European Patent Bar and The Unified Patent Court, meaning that he is licensed to practice in all patent proceedings before both the United States Patent & Trade Mark Office, the European Patent Office and The Unified Patent Court.
On the technical side, Dr. Lambrinos graduated with a first class honours Bachelor of Engineering degree in Electronics before obtaining a doctorate in Optical and Insulator Thin Film Technology from the University of Salford, UK in association with Grand Ecole Centrale de Lyon, France. His research experience includes development of advanced instrument clusters at Ford Motor Company and thin film III-V semiconductor & insulator fabrication at the Centre National de la Recherche Scientifique (CNRS) in France. Dr. Lambrinos has also prosecuted patents in these and other scientific fields for national laboratories including Los Alamos National Laboratory, New Mexico.
Before founding FAI, he practiced as a European Patent Attorney and an Associate Member of the UK Chartered Institute of Patent Attorneys at a long established firm of Patent & Trade Mark Attorneys in London. In addition to preparation and prosecution of domestic and international patent applications, he assisted in defending against European Patent Opposition and Appeals and supporting UK Counsel in post grant proceedings before the High Court of England & Wales. He also has extensive experience in filing and prosecuting European Designs.
Dr. Lambrinos regularly attends international meetings keeping abreast of recent patent law and practice. He has spoken at international venues on patent and intellectual property topics. He has a working knowledge of French and Italian.
Technical Publications
Thesis: A study of Silicon-Based Thin Film Insulators for Optical and Electronics Applications
M. F. Lambrinos, R. Valizadeh, and J. S. Colligon , Effects of bombardment on optical properties during the deposition of silicon nitride by reactive ion beam sputtering, Applied Optics, 35 (19), (1996), 3620-26.
M. F. Lambrinos, R. Valizadeh, and J. S .Colligon, Synthesis of silicon oxynitride by ion beam sputtering and the effects of ion-assisted bombardment, Nuclear Instruments and Methods in Physics Research, b. 127-128, (1997) 369.
M. F. Lambrinos, M. P. Besland, A. Gagnaire, P. Louis, S. Callard and J. Joseph, In-situ
photoluminescence control during fabrication of SiO2/InP structure, Journal of the Electrochemical Society 144 (6), (1997) 2086-95.
M. F. Lambrinos, R. Valizadeh, and J. S. Colligon, Electrical properties of ion beam sputtered and ion-assisted SiO2, SiOX NY and SiNX films on silicon, Journal of Vacuum Science and Technology, January, 1997.
M. F. Lambrinos, R Valizadeh, and J. S. Colligon, Synthesis of silicion oxynitride by ion beam sputtering and the effects of nitrogen ion-assisted bombardment, 10th International Conference on Ion Beam Modification of Materials (IBMM-96), Albuquerque, New Mexico, USA, 1996.
M. P. Besland, S. Jourba, M. Lambrinos, P. Louis, P. Viktorovitch, and G. Hollinger, Optimized SiO2/InP structures prepared by electron cyclotron resonance plasma, Journal of Applied Physics, 80(5), (1996), 3100-9.
J. Joseph, M. P. Besland, S.Callard, A. Gagnaire, M. Lambrinos, and G. Hollinger, In-situ control during growth of SiO2 films on InP by ECR plasma, Proceedings of the Tenth Symposium on Plasma Processing, San Francisco, 1994.